Advanced Printmaking Intensive, New York

Advanced Printmaking Intensive, New York

Columbia University School of the Arts

Image courtesy of Columbia University School of the Arts.
January 21, 2014
Advanced Printmaking Intensive, New York

Columbia University School of the Arts
2960 Broadway
New York, NY 10027

arts.columbia.edu

Advanced Printmaking Intensive: New York
May 27–July 3, 2014
Instructors: Professor Tomas Vu-Daniel, Adjunct Professor Craig Zammiello

The Advanced Printmaking intensive focuses on new and traditional printmaking techniques and developing skills on all levels. Students and professionals have access to all printmaking processes and equipment but will focus on a primary area of interest. Throughout the course, students have the opportunity to visit artists’ studios, other fine art printshops in New York, and view prints in exclusive print study rooms at the Metropolitan Museum of Art, The New York Public Library, and the Museum of Modern Art. Participants are also exposed to the inner workings of the LeRoy Neiman Center for Print Studies publishing operation at Columbia University.

“The printmaking intensive was a once in a lifetime opportunity. A combination of an immersive summer camp and printmaking boot camp, the intensive allowed me to explore all aspects of the print medium in a supportive, engaging environment and then focus that energy on my interests. The resources and instructors that were available to us are unparalleled in their depth and knowledge.”
-Kelsey Elverum (Columbia University, MFA ’15)

“The Advanced Printmaking Intensive was fantastic preparation for grad school and the most efficient way I can think of to have an amazing summer AND get as much work done as in an entire semester! Highly recommended for anyone interested in preparing a competitive portfolio for an MFA application!”
-Julia Phillips (Columbia University, MFA ’15)

Please visit the Columbia Summer Arts website to find out more about all our Visual Arts offerings. Email inquiries to [email protected] .

 

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